AJA ATC Orion sputter system is a compact high vacuum sputtering system for physical vapor deposition.
The system is equipped with 7 confocally-arranged 2” magnetron sputter guns and accommodates substrate sizes up to 100 mm wafer.
Multiple power supplies (2 DC and 1 RF) enable sputtering of metals, dielectrics, and magnetic materials.
Additional O2 and N2 gas feeds allow for reactive sputtering. Sputtering processes are computer controlled for precision film control.
More information about the Cleanroom can be found here.