This Cambridge Ultratech Savannah 200 system can support a variety of ALD processes with a robust software interface and up to 5 modular precursor sources.
Currently supported processes include: Al2O3, HfO2, TiO2.
Additional processes will be considered based on demand, and users may wish to consider providing their own precursor for very specific applications. Please discuss any needed processes not listed with the cleanroom manager. More information about the Cleanroom can be found here.