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Nanofab Cleanroom: Atomic Layer Deposition System (ALDS)

Nanofab Cleanroom: Atomic Layer Deposition System (ALDS)

LOCATION

Cleanroom (Space Science basement 06)

PRICING

Rice User Fee: $10/hr

Non-Profit Fee: $15.65/hr

For Profit Fee: $50/hr

Rice Training Fee: $20/hr

Non-Profit Training Fee: $31.30/hr

For Profit Training Fee: $170/hr

CONTACTS

Training Contact:

Jing Guo, jg78@rice.edu

Carlos Gramajo, cg70@rice.edu

Nadia Pervez, np65@rice.edu

 

Faculty in Charge:

Rafael Verduzco (rafaelv@rice.edu)

DESCRIPTION

This Cambridge Ultratech Savannah 200 system can support a variety of ALD processes with a robust software interface and up to 5 modular precursor sources.
Currently supported processes include: Al2O3, HfO2, TiO2.
Additional processes will be considered based on demand, and users may wish to consider providing their own precursor for very specific applications. Please discuss any needed processes not listed with the cleanroom manager. More information about the Cleanroom can be found here.