The Elionix ELS-G100 is a high speed, ultra high precision thermal field emission (TFE) electron beam lithography system. It generates patterns with a line width of 7nm. The system can maintain stable 1.8nm electron beam at 100kV. It is equipped with pieces holder and up to 6” wafer holder. The pre-alignment station can measure the stage coordinates for alignment pattern printing. More information about the Cleanroom can be found here.