Heidelberg MLA150 is a fast and flexible maskless photolithography system which can reach submicron resolution. The system is equipped a 375nm laser source ensuring compatibility with most commercial photoresists. It provide rapid prototype of new designs and ideas without costly photomasks. It can expose features over the entire area of the stage movement (200X200mm). It has front and backside alignment capabilities. MLA150 is now firmly established as an alternative to the traditional mask aligner.