Nanofab Cleanroom: Mask Aligner (EVG 620)

Nanofab Cleanroom: Maskless Photolithography System

Nanofab Cleanroom: New cleanroom access

Nanofab Cleanroom: NP Flex Optical Profilometer

Nanofab Cleanroom: Oxford DRIE (Deep Reactive Ion Etch system)

Nanofab Cleanroom: Plasma-Enhanced Chemical Vapor Deposition System (PECVD)

Deposition of silicon-based materials for nanofabrication

Nanofab Cleanroom: Rapid Thermal Processor (RTP)

Nanofab Cleanroom: Reflectometer (Filmetrics)

Nanofab Cleanroom: Spin Coaters

Nanofab Cleanroom: Thermal Evaporator

The thermal evaporator can be used to deposit thin films of metals and dielectric through physical vapor deposition in high vacuum. In our chamber there are four sources that can be used singly, in series or in coevaporation. There is also an oxygen source to prevent oxygen loss from oxides during evaporation.

Nanofab Cleanroom: Wafer Polisher

Nanofab Cleanroon: Heidelberg Maskless MLA150